Massively parallel, large-area maskless lithography

被引：15

作者：

Klosner, M ^{[1
]}

Jain, K ^{[1
]}

机构：

[1] Anvik Corp, Hawthorne, NY 10532 USA

来源：

APPLIED PHYSICS LETTERS | 2004年 / 84卷 / 15期

关键词：

D O I：

10.1063/1.1699449

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have developed a high-throughput scanning maskless lithography technology for patterning high-resolution features on large-area substrates. This technology, which features a spatial light modulator array and a seamless-stitching scanning technique, was used to perform imaging exposures at micron-level resolution, patterning seamlessly over exposure areas significantly larger than the field size of the projection lens. This technology is attractive for a variety of applications that currently rely on mask-based lithographic processes. (C) 2004 American Institute of Physics.

引用

收藏

页码：2880 / 2882

页数：3

相关论文

共 10 条

[1] Laser scanning for semiconductor mask pattern generation [J].

Allen, PC .

PROCEEDINGS OF THE IEEE, 2002, 90 (10) :1653-1669

[2] Two-dimensional micromachined flow sensor array for fluid mechanics studies [J].

Chen, J ;

Fan, ZF ;

Zou, J ;

Engel, J ;

Liu, C .

JOURNAL OF AEROSPACE ENGINEERING, 2003, 16 (02) :85-97

[3] High-speed microvia formation with UV solid-state lasers [J].

Dunsky, C .

PROCEEDINGS OF THE IEEE, 2002, 90 (10) :1670-1680

[4]

FREYER J, COMMUNICATION

[5]

HOLBROOK D, 1989, P SOC PHOTO-OPT INS, V210, P210

[6] Large-area, high-throughput, high-resolution lithography systems for flat-panel displays and microelectronic modules [J].

Jain, K ;

Dunn, T ;

Farmiga, N ;

Zemel, M ;

Weisbecker, C .

EMERGING LITHOGRAPHIC TECHNOLOGIES II, 1998, 3331 :197-206

[7] Large-area high-resolution lithography and photoablation systems for microelectronics and optoelectronics fabrication [J].

Jain, K ;

Zemel, M ;

Klosner, M .

PROCEEDINGS OF THE IEEE, 2002, 90 (10) :1681-1688

[8] A flexible micromachine-based shear-stress sensor array and its application to separation-point detection [J].

Jiang, FK ;

Lee, GB ;

Tai, YC ;

Ho, CM .

SENSORS AND ACTUATORS A-PHYSICAL, 2000, 79 (03) :194-203

[9] Maskless fabrication of light-directed oligonucleotide microarrays using a digital micromirror array [J].

Singh-Gasson, S ;

Green, RD ;

Yue, YJ ;

Nelson, C ;

Blattner, F ;

Sussman, MR ;

Cerrina, F .

NATURE BIOTECHNOLOGY, 1999, 17 (10) :974-978

[10]

Warkentin P. A., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V633, P286, DOI 10.1117/12.963733