Laser ablation of dielectrics with pulse durations between 20 fs and 3 ps

被引：209

作者：

Kautek, W ^{[1
]}

Kruger, J ^{[1
]}

Lenzner, M ^{[1
]}

Sartania, S ^{[1
]}

Spielmann, C ^{[1
]}

Krausz, F ^{[1
]}

机构：

[1] VIENNA UNIV TECHNOL,DEPT QUANTUM ELECT & LASER TECHNOL,A-1040 VIENNA,AUSTRIA

来源：

APPLIED PHYSICS LETTERS | 1996年 / 69卷 / 21期

关键词：

D O I：

10.1063/1.116810

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Laser-induced ablation has been extended down to a pulse duration of 20 fs generated by a Ti sapphire laser system at a wavelength of 780 nm. Barium aluminum borosilicate glass with an extremely high glass transformation temperature (similar to 600 degrees C) served as target material. The most significant observation was a substantial decrease of the ablation threshold Fluence at pulse durations below 100 fs. All results indicate a dominant role of multiphoton absorption in addition to collisional ionization in this time domain. (C) 1996 American Institute of Physics.

引用

页码：3146 / 3148

页数：3

共 17 条

[1] LASER-INDUCED ELECTRIC BREAKDOWN IN SOLIDS
BLOEMBER.N
[J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1974, QE10 (03) : 375 - 386
[2] LASER-INDUCED BREAKDOWN BY IMPACT IONIZATION IN SIO2 WITH PULSE WIDTHS FROM 7 NS TO 150 FS
DU, D
LIU, X
KORN, G
SQUIER, J
MOUROU, G
[J]. APPLIED PHYSICS LETTERS, 1994, 64 (23) : 3071 - 3073
[3] NANOSECOND AND FEMTOSECOND EXCIMER LASER ABLATION OF FUSED-SILICA
IHLEMANN, J
WOLFF, B
SIMON, P
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1992, 54 (04): : 363 - 368
[4] KAUTEK W, 1994, PROC SPIE, V2207, P600, DOI 10.1117/12.184768
[5] Femtosecond-pulse visible laser processing of transparent materials
Kruger, J
Kautek, W
[J]. APPLIED SURFACE SCIENCE, 1996, 96-8 : 430 - 438
[6] KRUGER J, IN PRESS P SPIE
[7] KRUGER J, IN PRESS APPL SURF S
[8] KRUGER JK, UNPUB
[9] SUB-20-FS, KILOHERTZ-REPETITION-RATE TI-SAPPHIRE AMPLIFIER
LENZNER, M
SPIELMANN, C
WINTNER, E
KRAUSZ, F
SCHMIDT, AJ
[J]. OPTICS LETTERS, 1995, 20 (12) : 1397 - 1399
[10] LENZNER M, UNPUB

← 1 2 →