Self-limited GaAs wire growth by MOVPE and application to InAs quantum dot array

We investigate the growth mode and the growth mechanisms of selectively grown GaAs nanometer wire structures by metalorganic vapor phase epitaxy (MOVPE). The nanometer wire structures with (111)A or(111)B facet sidewalls are grown on SiNx masked (001) GaAs with line and space pattern openings. As the growth proceeds, the growth rates increase because Ga atoms migrate from SiNx mask surface and (111) facet sidewalls. After the wire formation with triangular cross section is complete, no further growth occurs on the top of the wires, which is called self-limited growth mode. The shape and width of the top area are observed using a scanning electron microscope (SEM) and an atomic force microscope (AFM), and the mechanism of self-limited growth is discussed. We also simulate the growth rate during selective area growth. From the comparison with the experimental results and the simulation, we estimate the amounts of Ga atom migration from SiNx mask area and(lll) facet sidewalls to the wire areas. Finally, we form InAs quantum dots on these GaAs wires, and observe photoluminescence spectra from QDs.