Elastic relaxations in ultrathin epitaxial alloy films

被引：25

作者：

Ozolins, V ^{[1
]}

Asta, M

Hoyt, JJ

机构：

[1] Sandia Natl Labs, Livermore, CA 94550 USA

[2] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA

[3] Sandia Natl Labs, Albuquerque, NM 87185 USA

来源：

PHYSICAL REVIEW LETTERS | 2002年 / 88卷 / 09期

关键词：

D O I：

10.1103/PhysRevLett.88.096101

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Elastic interactions responsible for the stability of nanometer-scale patterns in ultrathin, bulk-immiscible-alloy films are analyzed within the context of a hybrid atomistic-continuum model. Two apparently different descriptions of alloy film behavior, a continuum elasticity theory describing a deformable substrate and a rigid substrate atomistic scheme, emerge naturally as limiting cases on long and short length scales, respectively. Quantitative first-principles calculations explain the origin of recently observed nanoscale patterns in Co-Ag/Ru(0001), and reveal a surprising failure of the continuum model.

引用

页码：4 / 961014

页数：4

共 17 条

[1] Spontaneous formation of indium-rich nanostructures on InGaN(0001) surfaces [J].