Cross section for removing chemisorbed oxygen from an aluminum target by sputtering

被引：15

作者：

Depla, D ^{[1
]}

De Gryse, R ^{[1
]}

机构：

[1] Univ Ghent, Dept Solid State Sci, B-9000 Ghent, Belgium

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2002年 / 20卷 / 02期

关键词：

D O I：

10.1116/1.1451254

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 [材料科学与工程]; 080502 [材料学];

摘要：

By chemisorption of oxygen on an aluminum target, an absolute target voltage increase is noticed which can be attributed to the reduction of the secondary electron emission from the target. By following the target voltage behavior during magnetron sputtering of the aluminum target precovered with a chemisorbed oxygen layer, the cross section for removing the chemisorbed layer could be calculated based on a proposed model that relates the measured target voltage to the target coverage. (C) 2002 American Vacuum Society.

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收藏

页码：521 / 525

页数：5

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