Step edge barrier controlled decay of multilayer islands on Cu(111)

被引:52
作者
Giesen, M [1 ]
Ibach, H [1 ]
机构
[1] Forschungszentrum Julich, Inst Grenzflachenforsch & Vakuumphys, D-52425 Julich, Germany
关键词
copper; Cu(111); decay; islands; step edge barrier;
D O I
10.1016/S0039-6028(99)00448-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Using scanning tunneling microscopy, we have studied the temperature dependent decay of multilayer Cu islands on Cu(lll). We focus on the normal diffusion limited decay of small islands on top of large islands where no rapid decay events occur. Using a numerical integration of the analytical expression for diffusion limited decay, we determine the step edge barrier as a function of temperature. The additional activation barrier for mass transport across the step edge is found to be 0.22 eV. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:109 / 115
页数:7
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