Semiconducting and ferromagnetic behavior of sputtered Co-doped TiO2 thin films above room temperature

被引:221
作者
Park, WK [1 ]
Ortega-Hertogs, RJ
Moodera, JS
Punnoose, A
Seehra, MS
机构
[1] MIT, Francis Bitter Natl Magnet Lab, Cambridge, MA 02139 USA
[2] W Virginia Univ, Dept Phys, Morgantown, WV 26506 USA
关键词
D O I
10.1063/1.1452650
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have investigated Co-doped TiO2 thin films grown by reactive co-sputtering. X-ray diffraction showed a single phase polycrystalline rutile structure, without any segregation of Co into particulates within the instrumental resolution limit. The atomic content of Co ranged from 1% to 12%. The temperature dependence of resistivity showed an extrinsic semiconducting behavior. From optical absorption measurements, the band gap E(g)approximate to3.25+/-0.05 eV was found, independent of the Co concentration, and in agreement with a literature value. Room temperature M-H loops showed a ferromagnetic behavior for Co content higher than 3%. The magnetic moment per Co atom was estimated to be about 0.94 mu(B), suggesting a low spin configuration of Co ions. The temperature dependence of remanent magnetization revealed a Curie temperature higher than 400 K for Co content of 12%. (C) 2002 American Institute of Physics.
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收藏
页码:8093 / 8095
页数:3
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