Microstereolithography using a dynamic mask generator and a non-coherent visible Light source

被引:43
作者
Monneret, S [1 ]
Loubère, V [1 ]
Corbel, S [1 ]
机构
[1] Ecole Natl Super Ind Chim, Dept Chim Phys React, F-54001 Nancy, France
来源
DESIGN, TEST, AND MICROFABRICATION OF MEMS AND MOEMS, PTS 1 AND 2 | 1999年 / 3680卷
关键词
stereolithography; microfabrication; photopolymer; microsystems;
D O I
10.1117/12.341246
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Laser stereolithography deals with the manufacture of three-dimensional objects that are made by space-resolved laser-induced polymerization. in order to obtain three dimensional micro-objects, we developed a new microstereolithography apparatus based on the use of a dynamic mask generator which allows the manufacture of a complete layer by only one irradiation, the part being manufactured layer by layer. This process is composed of a broad-band visible light source, that leads to the elimination of speckle effects resulting from the conventional use of a laser beam, and of a liquid crystal display as the dynamic mask generator.
引用
收藏
页码:553 / 561
页数:9
相关论文
共 26 条
[1]  
ALLAN R, 1997, ELECT DESIGN, V45
[2]  
ANDRE JC, 1994, STEREOLITHOGRAPHIE L
[3]  
Becker E. W., 1986, Microelectronic Engineering, V4, P35, DOI 10.1016/0167-9317(86)90004-3
[4]   Study of the spatial resolution of a new 3D microfabrication process: the microstereophotolithography using a dynamic mask-generator technique [J].
Bertsch, A ;
Yezequel, JY ;
Andre, JC .
JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY, 1997, 107 (1-3) :275-281
[5]   Microstereophotolithography using a liquid crystal display as dynamic mask-generator [J].
Bertsch, A ;
Zissi, S ;
Jezequel, JY ;
Corbel, S ;
Andre, JC .
MICROSYSTEM TECHNOLOGIES, 1997, 3 (02) :42-47
[6]  
BERTSCH A, 1994, P 3 FRANC JAP C MECH, V2, P631
[7]  
Burns M., 1993, AUTOMATED FABRICATIO
[8]   A PIEZOELECTRIC-DRIVEN STEREOLITHOGRAPHY-FABRICATED MICROPUMP [J].
CARROZZA, MC ;
CROCE, N ;
MAGNANI, B ;
DARIO, P .
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 1995, 5 (02) :177-179
[9]   Fabrication of high aspect ratio silicon microstructures by anodic etching [J].
Charlton, MDB ;
Parker, GJ .
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 1997, 7 (03) :155-158
[10]  
DECKERS DC, 1993, ADV PHOTOCHEM, V18, P315