Infrared distributed Bragg reflectors based on amorphous SiC/SiO2 heterostructures

被引:12
作者
Convertino, A
Valentini, A
Giugno, PV
Cingolani, R
机构
[1] UNIV LECCE,DIPARTIMENTO SCI MAT,UNITA INFM,I-73100 LECCE,ITALY
[2] CSELT SPA,TURIN,ITALY
关键词
D O I
10.1063/1.119063
中图分类号
O59 [应用物理学];
学科分类号
摘要
Amorphous SiC/SiO2 distributed Bragg reflectors (DBR) deposited by ion beam sputtering at room temperature is reported on in this letter. The DBR consists of only 2.5 pairs and exhibits high peak reflectivity (84%) around similar to 1.7 mu m with a full width at half maximum of about 1000 nm. The measured reflectivity spectrum is well reproduced by the equivalent layer theory by using the measured refractive indices of SiC and SiO2 and including absorption losses. (C) 1997 American Institute of Physics.
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页码:2799 / 2800
页数:2
相关论文
共 10 条
[1]   EFFECT OF RADIOFREQUENCY POWER AND SUBSTRATE-TEMPERATURE ON PROPERTIES OF HOT-PLASMA-BOX GLOW-DISCHARGE-DEPOSITED HYDROGENATED AMORPHOUS-SILICON CARBON ALLOYS [J].
BHUSARI, DM ;
KSHIRSAGAR, ST .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (04) :1743-1749
[2]  
Born M., 2006, PRINCIPLES OPTICS
[3]   HIGH-REFLECTIVITY VISIBLE-WAVELENGTH SEMICONDUCTOR NATIVE-OXIDE BRAGG REFLECTORS GROWN BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION [J].
HOLMES, AL ;
ISLAM, MR ;
CHELAKARA, RV ;
CIUBA, FJ ;
DUPUIS, RD ;
RIES, MJ ;
CHEN, EI ;
MARANOWSKI, SA ;
HOLONYAK, N .
APPLIED PHYSICS LETTERS, 1995, 66 (21) :2831-2833
[4]   GE0.2SI0.8/SI BRAGG-REFLECTOR MIRRORS FOR OPTOELECTRONIC DEVICE APPLICATIONS [J].
KUCHIBHOTLA, R ;
CAMPBELL, JC ;
BEAN, JC ;
PETICOLAS, L ;
HULL, R .
APPLIED PHYSICS LETTERS, 1993, 62 (18) :2215-2217
[5]   EFFECT OF ABSORPTION PERTURBATION ON THE REFLECTIVITY OF A QUARTER-WAVE DISTRIBUTED-BRAGG-REFLECTOR [J].
LAW, KK .
OPTICS COMMUNICATIONS, 1994, 108 (1-3) :8-12
[6]   ZNSE/CAF2 QUARTER-WAVE BRAGG REFLECTOR FOR THE VERTICAL-CAVITY SURFACE-EMITTING LASER [J].
LEI, C ;
ROGERS, TJ ;
DEPPE, DG ;
STREETMAN, BG .
JOURNAL OF APPLIED PHYSICS, 1991, 69 (11) :7430-7434
[7]   WIDE-BANDWIDTH DISTRIBUTED BRAGG REFLECTORS USING OXIDE GAAS MULTILAYERS [J].
MACDOUGAL, MH ;
ZHAO, H ;
DAPKUS, PD ;
ZIARI, M ;
STEIER, WH .
ELECTRONICS LETTERS, 1994, 30 (14) :1147-1149
[8]   DUAL-ION-BEAM SPUTTER-DEPOSITION OF ZNO FILMS [J].
QUARANTA, F ;
VALENTINI, A ;
RIZZI, FR ;
CASAMASSIMA, G .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (01) :244-248
[9]  
SHIMOMURA H, 1994, ELECTRON LETT, V30, P1049
[10]   URBACH TAIL AND GAP STATES IN HYDROGENATED A-SIC AND A-SIGE ALLOYS [J].
SKUMANICH, A ;
FROVA, A ;
AMER, NM .
SOLID STATE COMMUNICATIONS, 1985, 54 (07) :597-601