Exposure to Manufactured Nanostructured Particles in an Industrial Pilot Plant

被引:75
作者
Demou, Evangelia [1 ]
Peter, Philippe [1 ]
Hellweg, Stefanie [1 ]
机构
[1] ETH, Inst Environm Engn, CH-8093 Zurich, Switzerland
关键词
CPC; exposure; nanoparticles; particulate matter;
D O I
10.1093/annhyg/men058
中图分类号
R1 [预防医学、卫生学];
学科分类号
1004 ; 120402 ;
摘要
Objectives: Nanomaterial production and the number of people directly in contact with these materials are increasing. Yet, little is known on the association between exposure and corresponding risks, such as pulmonary inflammation and oxidative stress. Methods: Condensation Particle Counters, a DustTrak (TM) and Scanning Mobility Particle Sizer (TM) quantified real-time size, mass and number concentrations in a nanostructure particle pilot-scale production facility, using a high-temperature gas-phase process, over a 25-day period. Temporal and spatial analysis of particle concentrations and sizes was performed during production, maintenance and handling. Number-based particle retention of breathing mask filters used under real-time production and exposure conditions in the workplace was quantified. Results: The results demonstrate elevated number concentrations during production, which can be an order of magnitude higher than background levels. Average concentrations during production were 59 100 cm(-3) and 0.188 mg m(-3) for submicron particles. Mask filters decreased particle number concentrations by > 96%. Conclusions: This study demonstrates real-time worker exposure during gas-phase nanoparticle manufacturing. Qualitative and quantitative analysis of emission sources and concentration levels in a production plant is accomplished. These results are important for workers, employers and regulators in the nanotechnology field as they provide information on encountered exposures and possibilities for mitigation measures.
引用
收藏
页码:695 / 706
页数:12
相关论文
共 42 条
[1]  
Aitken R. C., 2004, NANOPARTICLES OCCUPA
[2]   Manikin-based performance evaluation of N95 filtering-facepiece respirators challenged with nanoparticles [J].
Balazy, A ;
Toivola, M ;
Reponen, T ;
Podgo,rski, A ;
Zimmer, A ;
Grinshpun, SA .
ANNALS OF OCCUPATIONAL HYGIENE, 2006, 50 (03) :259-269
[3]  
Bidwell JO, 2004, J INT SOC RESP PROT, V21, P94
[4]   Personal exposure to ultrafine particles in the workplace: Exploring sampling techniques and strategies [J].
Brouwer, DH ;
Gijsbers, JHJ ;
Lurvink, MWM .
ANNALS OF OCCUPATIONAL HYGIENE, 2004, 48 (05) :439-453
[5]  
Brown R.C., 1993, AIR FILTRATION INTEG, DOI DOI 10.1016/0021-8502(95)90072-1
[6]   Do nanoparticles interfere with human health? [J].
Brüske-Hohlfeld, I ;
Peters, A ;
Wichmann, HE .
GAIA-ECOLOGICAL PERSPECTIVES FOR SCIENCE AND SOCIETY, 2005, 14 (01) :21-23
[7]  
*DIN, 2001, 149 EN DIN
[8]  
*DIN, 2000, 143 EN DIN
[9]  
DONALDSON K, 2004, NANOMATERIALS RISK H, P30
[10]   What does respirator certification tell us about filtration of ultrafine particles? [J].
Eninger, Robert M. ;
Honda, Takeshi ;
Reponen, Tiina ;
Mckay, Roy ;
Grinshpun, Sergey A. .
JOURNAL OF OCCUPATIONAL AND ENVIRONMENTAL HYGIENE, 2008, 5 (05) :286-295