Nanostructuring by energetic ion beams

被引:15
作者
Avasthi, DK [1 ]
机构
[1] Ctr Nucl Sci, New Delhi 110067, India
来源
HYPERFINE INTERACTIONS | 2005年 / 160卷 / 1-4期
关键词
D O I
10.1007/s10751-005-9152-x
中图分类号
O64 [物理化学(理论化学)、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号
070203 ; 070304 ; 081704 ; 1406 ;
摘要
Development of nanostructured materials has become of wide interest due to their exotic properties and interesting physics aspects. Energetic ions play a crucial role in the development of nano materials. Ions of different energy regimes have different roles in growth of nano particles. Low energy ions (typically up to a (kiloelectronvolt) keV) in plasma, have been in use for growth of nano particle thin films. Low energy ions (typically a few hundred (kiloelectronvolt) keV) from ion implanters are used for growth of nano particles in a matrix. High energy heavy ions (swift heavy ions) have been in use in recent years for growth of nanostructures and also for modifying nanostructures. Highly charged slow moving ions and focused ion beams too, have potential for creating nanostructures. Out of these several possible roles of energetic ions, there have been developments at NSC Delhi in growth of nanostructures by RF plasma, low energy ions and swift heavy.
引用
收藏
页码:95 / 106
页数:12
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