Early stages of film creation in thin diblock copolymer films

被引:28
作者
Müller-Buschbaum, P
Gutmann, JS
Lorenz-Haas, C
Mahltig, B
Stamm, M
Petry, W
机构
[1] Tech Univ Munich, Dept Phys, D-85747 Garching, Germany
[2] Inst Polymerforsch Dresden EV, D-01069 Dresden, Germany
[3] Max Planck Inst Polymer Res, D-55128 Mainz, Germany
关键词
D O I
10.1021/ma002181v
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Thin poly(styrene-block-p-methylstyrene) diblock copolymer films on top of silicon substrates were examined right after preparation and during the early stages of annealing. Using specular and off-specular X-ray scattering as well as scanning force microscopy, the film morphology is determined. With the spin-coating technique films are prepared which exhibit a roughness correlation between the substrate and the copolymer surface within a limited film thickness and molecular weight range right after preparation. The transferred part of the roughness spectrum of the substrate is probed and explained as a morphology of a frozen liquid with a surface bending rigidity. During annealing the energetically unfavorable roughness replication decays, and an internal ordering is formed. The decay of long-range correlation is explained by a surface diffusion where diffusion is slowed down as compared to bulk behavior.
引用
收藏
页码:7463 / 7470
页数:8
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