Two-dimensional Si photonic crystals on oxide using SOI substrate

被引:27
作者
Shinya, A
Notomi, M
Yokohama, I
Takahashi, C
Takahashi, JI
Tamamura, T
机构
[1] Nippon Telegraph & Tel Corp, Basic Res Labs, Atsugi, Kanagawa 2430198, Japan
[2] Nippon Telegraph & Tel Corp, Telecommun Energy Labs, Atsugi, Kanagawa 2430198, Japan
关键词
asymmetrical structure; FDTD method; photonic band gap; photonic integrated circuit; transmission characteristics; two-dimensional photonic crystal;
D O I
10.1023/A:1013396524703
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Two-dimensional photonic crystals (2D-PhCs) on oxide can be easily incorporated into photonic integrated circuits. Although an asymmetrical structure (air/PhC/oxide) is advantageous in terms of ease of fabrication, it has been pointed out that such a structure may have no photonic band gap (PBG). To clarify the characteristics of the asymmetrical structure, we calculated the band structure using the three-dimensional (3D) FDTD method and measured the transmission characteristics of a fabricated 2D Si-PhC on oxide. The calculations show that we can use a quasi-PBG even in an asymmetrical structure when the PhC thickness satisfies the single-mode condition. The measured transmission characteristics correspond to the calculated band structure and reveal the existence of a quasi-PBG. These results show that the asymmetrical 2D Si-PhC-on-oxide structure can be applied to various optical devices.
引用
收藏
页码:113 / 121
页数:9
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