Photoactivity enhancement of WS2 sputtered thin films by use of nickel

被引:36
作者
Lignier, O
Couturier, G
Tedd, J
Gonbeau, D
Salardenne, J
机构
[1] UNIV BORDEAUX 1,CTR PHYS MOL OPT & HERTZIENNE,CNRS,URA 283,F-33405 TALENCE,FRANCE
[2] UNIV PAU & PAYS ADOUR,LPCM,CNRS,URA 474,F-64000 PAU,FRANCE
关键词
sputtering; nickel; Rutherford backscattering spectroscopy; X-ray diffraction;
D O I
10.1016/S0040-6090(96)09319-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Photoactive thin films of WS2 have been prepared by radio frequency magnetron sputtering. Physico-chemical properties of the films are mainly investigated by Rutherford backscattering and X-ray diffraction. Optical and transport properties are also studied. Films sputtered at a high substrate temperature are made of small bidimensional grains (2H-WS2) surrounded by amorphous boundaries. The photoactivity of these films is weak because of the electron trapping at boundaries. Films sputtered at a low substrate temperature are amorphous and then annealed to produce bidimensional films. It is shown that annealed Ni-coated films give highly textured samples. A nickel-sulphur phase is assumed to act as a surfactant. The strong photoactivity enhancement of these films is attributed to an increase in the grain size. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:45 / 52
页数:8
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