ORIENTATION OF RF-SPUTTER-DEPOSITED MOS2 FILMS

[1] ROUGHNESS EFFECT UPON OXYGEN-ADSORPTION ON SI(100) SURFACES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 902 - 905

[2] A NEGLECTED PARAMETER (WATER CONTAMINATION) IN SPUTTERING OF MOS2 FILMS [J]. THIN SOLID FILMS, 1986, 139 (02) : 157 - 168

[3] FUNDAMENTAL-ASPECTS OF THE ELECTRONIC-STRUCTURE, MATERIALS PROPERTIES AND LUBRICATION PERFORMANCE OF SPUTTERED MOS2 FILMS [J]. THIN SOLID FILMS, 1987, 154 (1-2) : 309 - 322

[4] FLEISCHAUER PD, 1986, ASLE T, V30, P160

[5] FLEISCHAUER PD, IN PRESS LANGMUIR

[6] FLEISCHAUER PD, 1983, ASLE T, V27, P82

[7] KOLTSOV SI, 1987, ZH FIZ KHIM+, V61, P1101

[8] Lince J. R., 1987, Journal of Materials Research, V2, P827, DOI 10.1557/JMR.1987.0827

[9] XRD EVIDENCE OF PREFERENTIAL ORIENTATION OF PLATINUM CRYSTALLITES ON GRAPHITE [J]. SURFACE SCIENCE, 1987, 184 (03) : 463 - 482

[1] ROUGHNESS EFFECT UPON OXYGEN-ADSORPTION ON SI(100) SURFACES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 902 - 905

[2] A NEGLECTED PARAMETER (WATER CONTAMINATION) IN SPUTTERING OF MOS2 FILMS [J]. THIN SOLID FILMS, 1986, 139 (02) : 157 - 168

[3] FUNDAMENTAL-ASPECTS OF THE ELECTRONIC-STRUCTURE, MATERIALS PROPERTIES AND LUBRICATION PERFORMANCE OF SPUTTERED MOS2 FILMS [J]. THIN SOLID FILMS, 1987, 154 (1-2) : 309 - 322

[4] FLEISCHAUER PD, 1986, ASLE T, V30, P160

[5] FLEISCHAUER PD, IN PRESS LANGMUIR

[6] FLEISCHAUER PD, 1983, ASLE T, V27, P82

[7] KOLTSOV SI, 1987, ZH FIZ KHIM+, V61, P1101

[8] Lince J. R., 1987, Journal of Materials Research, V2, P827, DOI 10.1557/JMR.1987.0827

[9] XRD EVIDENCE OF PREFERENTIAL ORIENTATION OF PLATINUM CRYSTALLITES ON GRAPHITE [J]. SURFACE SCIENCE, 1987, 184 (03) : 463 - 482