A NEGLECTED PARAMETER (WATER CONTAMINATION) IN SPUTTERING OF MOS2 FILMS

被引:47
作者
BUCK, V
机构
关键词
D O I
10.1016/0040-6090(86)90334-2
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:157 / 168
页数:12
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