Shadowing effects on the microstructure of obliquely deposited films

被引:63
作者
Paritosh [1 ]
Srolovitz, DJ
机构
[1] Princeton Univ, Princeton Mat Inst, Princeton, NJ 08544 USA
[2] Princeton Univ, Dept Mech & Aerosp Engn, Princeton, NJ 08544 USA
[3] Univ Michigan, Dept Chem Engn, Ann Arbor, MI 48109 USA
关键词
D O I
10.1063/1.1432125
中图分类号
O59 [应用物理学];
学科分类号
摘要
Two spatial dimension front tracking simulations have been performed to study the growth of polycrystalline, faceted films from randomly oriented nuclei by varying the deposition angle of the incident flux during physical vapor deposition. The orientation of grain columns, the porosity, the crystallographic texture, and grain size are sensitive to the deposition angle. The origin of this effect is widely believed to be associated with shadowing. In order to isolate the effects of shadowing from other physical effects (such as surface diffusion, deposition species size, flux divergence, etc.), we have constructed a simulation where all of these effects are completely removed. These simulations demonstrate that while many of the observed structural properties of obliquely deposited films are controlled by shadowing, a few key properties cannot be attributed solely to shadowing. (C) 2002 American Institute of Physics.
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收藏
页码:1963 / 1972
页数:10
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