Misfit dislocations in In-rich InGaN/GaN quantum well structures

被引:49
作者
Costa, PMFJ
Datta, R
Kappers, MJ
Vickers, ME
Humphreys, CJ
Graham, DM
Dawson, P
Godfrey, MJ
Thrush, EJ
Mullins, JT
机构
[1] Univ Cambridge, Dept Mat Sci & Met, Cambridge CB2 3QZ, England
[2] Univ Manchester, Sch Phys & Astron, Manchester M60 1QD, Lancs, England
[3] Thomas Swan Sci Equipment Ltd, Cambridge CB4 5UG, England
来源
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2006年 / 203卷 / 07期
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1002/pssa.200565219
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Strain relaxation has been studied for the 10-period quantum well (QW) heterostructures grown by MOVPE, In0.16Ga0.84N/GaN and In0.2Ga0.8N/GaN, both emitting with high efficiency in the blue and green regions, respectively. Additionally, a set of high-In content InGaN/GaN QW structures, where growth parameters were kept constant but QW numbers varied between I and 10, were also analysed by TEM, XRD and PL. For the highly-efficient green and the set of variable QW samples, TEM structural studies identified large well-width fluctuations and misfit dislocations that thread into the sample surface and are generated in the quantum. well stack. This contrasts with similar observations of blue-emitting MQWs where misfit dislocations arc! not seen. PL measurements have been carried out for the In-rich QW series and did not reveal a greater degradation of the optical properties with increasing numbers of quantum wells in the stack. (c) 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:1729 / 1732
页数:4
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