The effect of F, Cl and Br doping on the growth and structural properties of sprayed SnO2 films

被引:7
作者
Agashe, C
Major, SS
机构
[1] Department of Physics, Indian Institute of Technology, Powai
关键词
D O I
10.1088/0022-3727/29/12/008
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effect of halogen (F, CI and Br) doping on growth kinetics and structural properties of spray pyrolytically deposited tin dioxide (SnO2) films was studied in detail. The strengths of the halo-acids and hence the electronegativities of the halogens played an important role in governing the reaction processes which controlled the growth kinetics of the films. F doping affected the growth rate of a firn the least, whereas Cf and Br doping reduced the growth rate to an increasing extent. The structural properties were less affected by doping. The films were polycrystalline and remained highly textured along the [200] direction irrespective of the dopant as well as of the doping level. The grain size remained essentially the same regardless of the dopant.
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页码:2988 / 2991
页数:4
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