Electrical properties and microstructures of Pt/Ba0.5Sr0.5TiO3/SrRuO3 capacitors

被引:60
作者
Izuha, M [1 ]
Abe, K [1 ]
Koike, M [1 ]
Takeno, S [1 ]
Fukushima, N [1 ]
机构
[1] TOSHIBA CO LTD,CTR RES & DEV,ENVIRONM ENGN LABS,SAIWAI KU,KAWASAKI,KANAGAWA 210,JAPAN
关键词
D O I
10.1063/1.118590
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thin film polycrystalline Ba0.5Sr0.5TiO3 capacitors employing conductive perovskite oxide SrRuO3 as a bottom electrode were fabricated on Si substrates by rf-magnetron sputtering. Dielectric constants of these capacitors were observed to be 206, 214, and 146 for 60, 40, and 20 nm Ba0.5Sr0.5TiO3 (BSTO) thicknesses, respectively. The lowest SiO2 equivalent thickness of 0.54 nm was obtained for 20-nm-thick BSTO capacitors; their leakage current density was less than 1 x 10(-7) A/cm(2) for +/- 1.8 V bias. The cross-sectional transmission electron microscope observation revealed that BSTO and SrRuO3 (SRO) formed continuous columnar grains and showed epitaxial growth at the interface of BSTO/SRO within each column; this microstructure of the capacitors was tentatively designated ''local epitaxial film.'' (C) 1997 American Institute of Physics.
引用
收藏
页码:1405 / 1407
页数:3
相关论文
共 10 条
[1]   EPITAXIAL-GROWTH AND DIELECTRIC-PROPERTIES OF (BA0.24SR0.76)TIO3 THIN-FILM [J].
ABE, K ;
KOMATSU, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (9B) :5297-5300
[2]   Low temperature processing of Nb-doped Pb(Zr,Ti)O-3 capacitors with La0.5Sr0.5CoO3 electrodes [J].
AlShareef, HN ;
Tuttle, BA ;
Warren, WL ;
Dimos, D ;
Raymond, MV ;
Rodriguez, MA .
APPLIED PHYSICS LETTERS, 1996, 68 (02) :272-274
[3]  
HOU SY, 1995, MATER RES SOC SYMP P, V361, P99
[4]   STRUCTURE AND PROPERTIES OF EPITAXIAL BA0.5SR0.5TIO3/SRRUO3/ZRO2 HETEROSTRUCTURE ON SI GROWN BY OFF-AXIS SPUTTERING [J].
HOU, SY ;
KWO, J ;
WATTS, RK ;
CHENG, JY ;
FORK, DK .
APPLIED PHYSICS LETTERS, 1995, 67 (10) :1387-1389
[5]  
INUKAI T, 1985, JPN J APPL PHYS S24, V1, P21
[6]  
IZUHA M, UNPUB
[7]   STRUCTURAL AND ELECTRICAL-PROPERTIES OF BA0.5SR0.5TIO3 THIN-FILMS WITH CONDUCTIVE SRRUO3 BOTTOM ELECTRODES [J].
JIA, QX ;
WU, XD ;
FOLTYN, SR ;
TIWARI, P .
APPLIED PHYSICS LETTERS, 1995, 66 (17) :2197-2199
[8]   Electrical and microstructural degradation with decreasing thickness of (Ba, Sr)TiO3 thin films deposited by RF magnetron sputtering [J].
Paek, SH ;
Won, JH ;
Lee, KS ;
Choi, JS ;
Park, CS .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (11) :5757-5762
[9]   FERROELECTRIC LA-SR-CO-O/PB-ZR-TI-O/LA-SR-CO-O HETEROSTRUCTURES ON SILICON VIA TEMPLATE GROWTH [J].
RAMESH, R ;
GILCHRIST, H ;
SANDS, T ;
KERAMIDAS, VG ;
HAAKENAASEN, R ;
FORK, DK .
APPLIED PHYSICS LETTERS, 1993, 63 (26) :3592-3594
[10]  
WILLS LM, 1995, MATER RES SOC S P, V361, P417