Plasma enhanced chemical vapor deposition of palladium in anodic aluminum oxide template

被引：5

作者：

Kim, Young-Soon ^{[1
]}

Godbole, V. P. ^{[1
]}

Cho, Joong-Hee ^{[1
]}

Khang, Gilson ^{[2
]}

Shin, Hyung-Shik ^{[1
]}

机构：

[1] Chonbuk Natl Univ, Sch Chem Engn, 664-14 Duckjingu, Jeonju 561756, South Korea

[2] Chonbuk Natl Univ, Dept Polymer Nano Sci & Technol, Jeonju 561756, South Korea

来源：

CURRENT APPLIED PHYSICS | 2006年 / 6卷

关键词：

Plasma assisted CVD; Palladium; Anodic aluminum oxide (AAO);

D O I：

10.1016/j.cap.2006.01.012

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

High quality AAO templates were fabricated using multi-step electrochemical process. The formation of well ordered pores having dimensions of 50-100 nm diameters and up to 2000 nm depths, could be achieved. The effect of processing time, voltage during anodization, etc. have been studied. The freshly fabricated AAO templates are used to deposit palladium films using RF-plasma chemical vapor deposition using palladium hexafluro-acetylacetonate [Pd(C5HF6O2)(2)], as a precursor material. The samples were characterized by using high resolution scanning electron microscopy (SEM), energy dispersive X-ray analysis (EDX), glancing angle X-ray diffraction etc. It is observed that the conformal coatings of palladium could be achieved in AAO pores, which could subsequently be utilized for many applications where in catalytic behavior of palladium is utilized. (C) 2006 Elsevier B.V. All rights reserved.

引用

页码：E58 / E61

页数：4

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