An approach to cost-effective, robust, large-area electronics using monolithic silicon

被引:30
作者
Huang, Kevin [1 ]
Dinyari, Rostam [1 ]
Lanzara, Giulia [2 ]
Kim, Jong Yon [1 ]
Feng, Jianmin [2 ]
Vancura, Cyril
Chang, Fu-Kuo [2 ]
Peumans, Peter [1 ,3 ]
机构
[1] Stanford Univ, Dept Elect Engn, Palo Alto, CA 94304 USA
[2] Stanford Univ, Dept Aeronaut & Astronaut, Stanford, CA 94305 USA
[3] Robert Bosch LLC, Res & Tech Ctr, Palo Alto, CA USA
来源
2007 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, VOLS 1 AND 2 | 2007年
关键词
D O I
10.1109/IEDM.2007.4418906
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have developed an approach to build large-area electronics from monolithic silicon integrated circuits. The method used deep reactive ion etching to structure a monolithic silicon substrate into a stretchable, two-dimensional, wired network that can be expanded to cover large planar or curved surfaces to realize high-performance, large-area, monolithic silicon electronics in a cost-effective manner. This approach has applications in sensing, smart materials, electronic textile, RFID tag and microconcentrator solar cell manufacturing.
引用
收藏
页码:217 / +
页数:2
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