Focused ion beam patterning for fabrication of periodical two-dimensional zinc oxide nanodot arrays

被引：7

作者：

Ueda, M

Kim, SW

Fujita, S ^{[1
]}

Fujita, S ^{[1
]}

机构：

[1] Kyoto Univ, Int Innovat Ctr, Sakyo Ku, Kyoto 6068501, Japan

[2] Kyoto Univ, Dept Elect Sci & Engn, Nishikyo Ku, Kyoto 6068501, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2004年 / 43卷 / 5B期

关键词：

ZnO; nanodot; two-dimensional array; artificial nanostructure; FIB;

D O I：

10.1143/JJAP.43.L652

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Widely well-aligned two-dimensional ZnO nanodot arrays (e.g., 40,000 nanodots of 130 nm diameter and 9 nm height over 150 x 150 mum(2) with a period of 750 nm) have been fabricated by metalorganic chemical vapor deposition on SiO2/Si substrates patterned by focused ion beam (FIB). A low-magnification FIB patterning mode allowed the periodical nanopatterning of the substrates over a large area in a short time. Cathodoluminescence and photoluminescence were apparently observed from the ZnO nanodots.

引用

收藏

页码：L652 / L654

页数：3

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