Transparent Conductive Gas-Permeation Barriers on Plastics by Atomic Layer Deposition

被引：40

作者：

Chou, Chun-Ting ^{[1
]}

Yu, Pei-Wei ^{[1
]}

Tseng, Ming-Hung ^{[1
]}

Hsu, Che-Chen ^{[1
]}

Shyue, Jing-Jong ^{[1
,2
]}

Wang, Ching-Chiun ^{[3
]}

Tsai, Feng-Yu ^{[1
]}

机构：

[1] Natl Taiwan Univ, Dept Mat Sci & Engn, Taipei 106, Taiwan

[2] Acad Sinica, Res Ctr Appl Sci, Taipei 115, Taiwan

[3] Ind Technol Res Inst, Mech & Syst Res Labs, Hsinchu 310, Taiwan

来源：

ADVANCED MATERIALS | 2013年 / 25卷 / 12期

关键词：

transparent conducting oxides; atomic layer deposition; encapsulation; moisture barriers; flexible electronics; THIN-FILM ENCAPSULATION; DIFFUSION BARRIERS; POLYMERS; GROWTH; AL2O3; OXIDES; CELLS;

D O I：

10.1002/adma.201204358

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A mixed-deposition atomic layer deposition process produces Hf:ZnO films with uniform dopant distribution and high electrical conductivity (resistivity = 4.5 x 10(-4) Omega cm), optical transparency (>85% from 400-1800 nm), and moisture-barrier property (water vapor transmission rate = 6.3 x 10(-6) g m(-2) day(-1)).

引用

页码：1750 / 1754

页数：5

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