Ca test of Al2O3 gas diffusion barriers grown by atomic layer deposition on polymers

被引：373

作者：

Carcia, P. F. ^{[1
]}

McLean, R. S.

Reilly, M. H.

Groner, M. D.

George, S. M.

机构：

[1] Dupont Res & Dev, Expt Stn, Wilmington, DE 19880 USA

[2] Univ Colorado, Dept Chem & Biochem, Boulder, CO 80309 USA

[3] Univ Colorado, Dept Chem & Biol Engn, Boulder, CO 80309 USA

来源：

APPLIED PHYSICS LETTERS | 2006年 / 89卷 / 03期

关键词：

D O I：

10.1063/1.2221912

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Quantitative Ca tests were used to determine the water vapor transmission rate (WVTR) through 25 nm thick Al2O3 gas diffusion barriers grown on plastic by atomic layer deposition (ALD). The measured WVTRs were 1.7x10(-5) g/m(2) day at 38 degrees C and 6.5x10(-5) g/m(2) day at 60 degrees C. Based on the apparent activation energy, the WVTR at 23 degrees C is estimated to be only 6x10(-6) g/m(2) day. The WVTR values for the Al2O3 ALD film are very similar to the WVTR value for the glass control. These Ca tests indicate that Al2O3 ALD gas diffusion barriers should enable display and lighting applications of highly moisture sensitive organic light-emitting diodes on plastic. (c) 2006 American Institute of Physics.

引用

页数：3

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