Wettability of nanoengineered dual-roughness surfaces fabricated by UV-assisted capillary force lithography

被引:92
作者
Jeong, Hoon Eui [1 ]
Kwak, Moon Kyu [1 ]
Park, Chan Ick [1 ]
Suh, Kahp Yang [1 ,2 ]
机构
[1] Seoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South Korea
[2] Seoul Natl Univ, Inst Adv Machinery & Design, Seoul 151742, South Korea
关键词
Wettability; Lithography; Dual roughness; Hierarchical structure; SUPER-HYDROPHOBIC SURFACES; SUPERHYDROPHOBIC SURFACES; HIERARCHICAL STRUCTURES; WETTING TRANSITION; WATER; STATES; STABILITY; PRESSURE; ADHESION; POLYMER;
D O I
10.1016/j.jcis.2009.07.020
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Micro- and nanoscale combined hierarchical polymer structures were fabricated by UV-assisted capillary force lithography. The method is based on the sequential application of engraved polymer molds with a UV-curable resin of polyurethane acrylate (PUA) followed by surface treatment with a trichloro(1H, 1H, 2H, 2H-perfluorooctyl) silane in vapor phase. Two distinct wetting states were observed on these dual-roughness structures. One is "Cassie-Wenzel state" where a water droplet forms heterogeneous contact with microstructures and homogeneous contact with nanostructures. The other is "Cassie-Cassie state" where a droplet makes heterogeneous contact both with micro-and nanostructures. A simple thermodynamic model was developed to explain static contact angle, hysteresis, and wetting transition on dual-roughness structures. (C) 2009 Elsevier Inc. All rights reserved.
引用
收藏
页码:202 / 207
页数:6
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