Magnetoresistance in the magnetization reversal process of micropatterned Co wires

被引：5

作者：

Shimazu, Y ^{[1
]}

Ohkubo, M ^{[1
]}

Morinaga, K ^{[1
]}

机构：

[1] Yokohama Natl Univ, Fac Engn, Dept Phys, Hodogaya Ku, Yokohama, Kanagawa 2408501, Japan

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2002年 / 240卷 / 1-3期

关键词：

magnetoresistance; magnetization reversal; micromagnetic structures; domain structure;

D O I：

10.1016/S0304-8853(01)00715-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We measured the magnetoresistance (MR) and magnetization of Co wires of various widths in the range from 0.3 to 200 mum. The observed width dependence of some characteristics of MR is attributed to the change of the domain structure. As the width decreased below 1 mum, an abrupt jump appeared in the longitudinal MR. This can be interpreted as due to an abrupt reversal of the overall magnetization. The measured longitudinal MR was compared with the calculation in the Stoner-Wohlfarth model. (C) 2002 Elsevier Science B.V. All ights reserved.

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页码：17 / 20

页数：4

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