Low-damage surface treatment by gas cluster-ion beams

被引：8

作者：

Akizuki, M ^{[1
]}

Harada, M ^{[1
]}

Miyai, Y ^{[1
]}

Doi, A ^{[1
]}

Yamaguchi, T ^{[1
]}

Matsuo, J ^{[1
]}

Takaoka, GH ^{[1
]}

Ascheron, CE ^{[1
]}

Yamada, I ^{[1
]}

机构：

[1] KYOTO UNIV,ION BEAM ENGN EXPT LAB,KYOTO 606,JAPAN

来源：

SURFACE REVIEW AND LETTERS | 1996年 / 3卷 / 01期

关键词：

D O I：

10.1142/S0218625X96001601

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Low-damage irradiation effects of gas cluster-ion beams have been studied at acceleration voltages below 20 kV. The surfaces of targets have been smoothened significantly by CO2-cluster-ion irradiation at normal incidence. Si substrate surfaces have been cleaned and exhibited low damage after CO2- and Ar-cluster-ion irradiation at low doses. In the case of CO2-cluster-ion irradiation, SiO2 film of about 5.5-nm thickness have grown on Si substrate at room temperature. A damaged layer of less than 2.5-nm thickness has been formed underneath the SiO2 film.

引用

页码：891 / 895

页数：5

共 6 条

[1]

ANDERSON HH, 1983, SPUTTERING PARTICLE, V1, P200

[2]

CARTER GC, 1983, SPUTTERING PARTICLE, V2, P241

[3]

INSEPOV Z, 1993, P 3 IUMRS INT C ADV

[4]

MAYER TM, UNPUB J APPL PHYS

[5] IONIZED CLUSTER BEAMS - PHYSICS AND TECHNOLOGY [J].

YAMADA, I ;

TAKAOKA, GH .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (5A) :2121-2141

[6] SURFACE MODIFICATION WITH GAS CLUSTER ION-BEAMS [J].

YAMADA, I ;

BROWN, WL ;

NORHBY, JA ;

SOSNOWSKI, M .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 79 (1-4) :223-226

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