In-situ REM study of Au-induced faceting on Si(113) surface

被引：11

作者：

Kurahashi, N ^{[1
]}

Minoda, H ^{[1
]}

Tanishiro, Y ^{[1
]}

Yagi, K ^{[1
]}

机构：

[1] Tokyo Inst Technol, Dept Phys, Meguro Ku, Tokyo 1528551, Japan

来源：

SURFACE SCIENCE | 1999年 / 438卷 / 1-3期

关键词：

adsorption-induced faceting; Au deposition; reflection electron microscopy; Si(113) surface;

D O I：

10.1016/S0039-6028(99)00556-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Au was deposited on Si(113) surfaces at temperatures between 700 degrees C and 850 degrees C. Initially (below similar to 0.2 ML) the structure changed to a two-fold structure along the [33 (2) over bar] direction. Beyond similar to 0.2 ML deposition, nucleation of faceted regions with (225), (119) orientations together with a four-fold structure of the (113) surface are noticed. This indicates that the Si(113) surface with low surface energy partially decomposes into (225) and (119) facets by Au deposition. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：91 / 96

页数：6

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