Carrier-induced change due to doping in refractive index of InP: Measurements at 1.3 and 1.5 mu m

被引:13
作者
Chusseau, L
Martin, P
Brasseur, C
Alibert, C
Herve, P
Arguel, P
LozesDupuy, F
Rao, EVK
机构
[1] EINDHOVEN UNIV TECHNOL,DEPT ELECT ENGN,NL-5600 MB EINDHOVEN,NETHERLANDS
[2] LAB ANAL & ARCHITECTURE SYST,CNRS,F-31077 TOULOUSE,FRANCE
[3] FRANCE TELECOM,CNET,CTR PARIS B,F-92220 BAGNEUX,FRANCE
关键词
D O I
10.1063/1.116837
中图分类号
O59 [应用物理学];
学科分类号
摘要
Accurate measurements of the InP refractive index as a function of free-carrier doping are reported at 1.3 and 1.5 mu m, the two strategic wavelengths for optical communications. A total of 21 samples with different N- and P-doping levels have been measured using a novel and simplified grating-coupling technique. Ln contrast to the conventional method, this only involves the use of a directly etched diffraction grating on the sample surface, thereby avoiding the necessity of a specific guiding layer. The measured index, in agreement with earlier predictions, decreases by more than 0.05 when the N doping is increased from below 10(15) to about 10(19) electrons per cubic centimeter, This effect, however, is much less pronounced with P doping than with N doping. (C) 1996 American Institute of Physics.
引用
收藏
页码:3054 / 3056
页数:3
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