Role of intericosahedral chains on the hardness of sputtered boron carbide films

被引：16

作者：

Jacobsohn, LG ^{[1
]}

Averitt, RD

Wetteland, CJ

Schulze, RK

Nastasi, M

Daemen, LL

Jenei, Z

Asoka-Kumar, P

机构：

[1] Los Alamos Natl Lab, Div Mat Sci & Technol, Los Alamos, NM 87545 USA

[2] Los Alamos Natl Lab, Manuel Lujan Jr Neutron Scattering Ctr, Los Alamos, NM 87545 USA

[3] Lawrence Livermore Natl Lab, Livermore, CA 94550 USA

来源：

APPLIED PHYSICS LETTERS | 2004年 / 84卷 / 21期

关键词：

D O I：

10.1063/1.1755841

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The relationship between the structure and mechanical properties of sputter-deposited boron carbide films was investigated. Changes in the structure induced by annealing were characterized in terms of chemical composition, chemical bonding, and concentrations of defects and trapped impurities. The creation of intericosahedral chains for higher annealing temperatures was revealed by infrared and Raman measurements, and the intensity of the infrared band at 1500 cm(-1) was found to be related to the hardness. The presence of residual trapped Ar atoms and of open-volume defects is insensitive to relatively high annealing temperatures and does not influence the recovery of the hardness. Our results suggest postdeposition annealing as a pathway to enhance the mechanical properties of boron carbide films. (C) 2004 American Institute of Physics.

引用

页码：4173 / 4175

页数：3

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