The kinetics of indium/amorphous-selenium multilayer thin film reactions

被引:18
作者
Lu, K
Sui, ML
Perepezko, JH
Lanning, B
机构
[1] Univ Wisconsin, Dept Mat Sci & Engn, Madison, WI 53706 USA
[2] Acad Sinica, Inst Met Res, State Key Lab RSA, Shenyang 110015, Peoples R China
[3] Lockheed Martin Aerosp, Littleton, CO 80127 USA
关键词
D O I
10.1557/JMR.1999.0103
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The reaction kinetics in vapor-deposited indium/amorphous-selenium (a - Se) multilayer thin films were studied using differential scanning calorimetry (DSC), x-ray diffraction (XRD), and transmission electron microscopy (TEM), A number of reactions were observed upon heating with characteristic temperatures which were found to be independent of the multilayer modulation wavelength. The initial interface reaction between In and a-Se is the formation of an In2Se phase. Kinetic analyses of the In2Se formation process combined with TEM observations indicated chat interface reaction is characterized by the two-dimensional growth of pre-existing In2Se regions formed during deposition to impingement in the plane of the original In/a-Se interface. The change of the density of In2Se grains with temperature was analyzed in terms of the derived kinetic parameters, which is consistent with TEM observations and the heat release measurements.
引用
收藏
页码:771 / 779
页数:9
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