Magnetic ceramic films from a metallopolymer resist using reactive ion etching in a secondary magnetic field

被引：51

作者：

Clendenning, SB

Han, S

Coombs, N

Paquet, C

Rayat, MS

Grozea, D

Brodersen, PM

Sodhi, RNS

Yip, CM

Lu, ZH ^{[1
]}

Manners, I

机构：

[1] Univ Toronto, Dept Mat Sci & Engn, Toronto, ON M5S 3E4, Canada

[2] Univ Toronto, Dept Chem Engn & Appl Chem, Surface Interface Ontario, Toronto, ON M5S 3E5, Canada

[3] Univ Toronto, Inst Biomat & Biomed Engn, Dept Chem Engn & Appl Chem, Toronto, ON M5S 3G9, Canada

[4] Univ Toronto, Dept Chem, Toronto, ON M5S 3H6, Canada

来源：

ADVANCED MATERIALS | 2004年 / 16卷 / 04期

关键词：

D O I：

10.1002/adma.200306262

中图分类号：

O6 [化学];

学科分类号：

0703 [化学];

摘要：

Magnetic ceramic films containing metal-rich nanoworm reticulations 200-550 nm wide have been fabricated from a highly metallized metallopolymer resist (see Figure) using oxygen or hydrogen plasma reactive ion etching in a secondary magnetic field. Applications may be found in spintronics and logic circuits.

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收藏

页码：291 / +

页数：7

相关论文

共 47 条

[1]

Ceramics containing magnetic co-fe alloy nanoparticles from the pyrolysis of a highly metallized organometallic polymer precursor [J].

Berenbaum, A ;

Ginzburg-Margau, M ;

Coombs, N ;

Lough, AJ ;

Safa-Sefat, A ;

Greedan, JE ;

Ozin, GA ;

Manners, I .

ADVANCED MATERIALS, 2003, 15 (01) :51-+

[2]

Synthesis characterization, and the platinum-catalyzed ring-opening polymerization and stereoselective dimerization of silicon-bridged [1]ferrocenophanes with acetylenic substituents [J].

Berenbaum, A ;

Lough, AJ ;

Manners, I .

ORGANOMETALLICS, 2002, 21 (21) :4415-4424

[3]

Briggs D., 1990, PRACTICAL SURFACE AN

[4]

Brodie I., 1992, PHYS MICRONANOFABRIC

[5]

Reactive ion etching of cylindrical polyferrocenylsilane block copolymer micelles:: Fabrication of ceramic nanolines on semiconducting substrates [J].

Cao, L ;

Massey, JA ;

Winnik, MA ;

Manners, I ;

Riethmüller, S ;

Banhart, F ;

Spatz, JP ;

Möller, M .

ADVANCED FUNCTIONAL MATERIALS, 2003, 13 (04) :271-276

[6]

Curious morphology of silicon-containing polymer films on exposure to oxygen plasma [J].

Chan, VZH ;

Thomas, EL ;

Frommer, J ;

Sampson, D ;

Campbell, R ;

Miller, D ;

Hawker, C ;

Lee, V ;

Miller, RD .

CHEMISTRY OF MATERIALS, 1998, 10 (12) :3895-3901

[7]

MECHANISM OF OXYGEN PLASMA-ETCHING OF POLYDIMETHYL SILOXANE FILMS [J].

CHOU, NJ ;

TANG, CH ;

PARASZCZAK, J ;

BABICH, E .

APPLIED PHYSICS LETTERS, 1985, 46 (01) :31-33

[8]

Lithographic applications of highly metallized polyferrocenylsilanes [J].

Clendenning, SB ;

Manners, I .

MACROMOLECULAR SYMPOSIA, 2003, 196 :71-76

[9]

Room temperature magnetic quantum cellular automata [J].

Cowburn, RP ;

Welland, ME .

SCIENCE, 2000, 287 (5457) :1466-1468

[10]

Micropatterning of block copolymer solutions [J].

Deng, T ;

Ha, YH ;

Cheng, JY ;

Ross, CA ;

Thomas, EL .

LANGMUIR, 2002, 18 (18) :6719-6722

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