Novel fast atom beam (FAB) processes for fabricating functional nanostructures on three-dimensional microstructures

We have developed four manufacturing processes that use a fast atom beam (FAB) for fabricating functional nanostructures on three-dimensional (3-D) microstructures. Such fabrication involves two steps: (1) producing the 3-D microstructure; and (2) producing the nanometer-size functional structures at a local point on this microstructure. The FAB methods that we developed for the first step are the separated (non-contact) mask FAB (SM-FAB) and moving mask FAB (MM-FAB), and those for the second step are the nanometer-motion moving mask FAB (NMM-FAB) and electron-beam deposition-pattern FAB (ED-FAB). We previously demonstrated the capability of the SM-FAB, by producing a multi-faced microstructure, a micro gojyunoto (named after an old Japanese temple tower). In this study, we describe and demonstrate the capability of the MM-FAB, by producing multiple, multi-curved and sloped structure, a diffraction grating structure; the NMM-FAB, by producing ultra-fine stairs, 30 nm wide and 30 nm high; and the ED-FAB, by producing a GaAs line structure, 55.3 nm wide and 13.6 nm high. These results show that these FAB methods are effective in producing 3-D microstructures and nanostructures. Combinations of these methods will make it possible to produce functional nanostructures on 3-D microstructures.