Recent developments in vacuum arc deposition

被引：34

作者：

Boxman, RL ^{[1
]}

机构：

[1] Tel Aviv Univ, Fleischman Fac Engn, Elect Discharge & Plasma Lab, IL-69978 Tel Aviv, Israel

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 2001年 / 29卷 / 05期

关键词：

cathodic arc; coatings; filtered vacuum arc; thin films; vacuum arc;

D O I：

10.1109/27.964471

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Vacuum arc deposition (VAD) has become an established industrial art for producing hard, wear-resistant and decorative coatings. Sophisticated coatings, including tertiary compounds and multilayers, are increasingly used. Filtered VAD and hot electrode vacuum arcs are increasingly investigated to obtain high-quality, macroparticle-free films. Improved filtered sources, including large rectangular filters, have been demonstrated. Besides tool coatings, films for metallizing integrated circuits and protecting magnetic media are being developed.

引用

页码：762 / 767

页数：6

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