Three-dimensional microdrilling of glass by multiphoton process and chemical etching

We demonstrate the three-dimensional microdrilling of glass by the multiphoton process with nonresonant femtosecond laser pulses and by the subsequent chemical etching. We use photomachinable glass which is sensitive to cw UV light of a wavelength shorter than 320 nm. After the focused irradiation of nonresonant femtosecond laser pulses at 400 nm and subsequent heat treatment, crystallites of Li(2)O . SiO(2), which are more soluble in dilute hydrofluoric acid than matrix glass, precipitate in the focused area of the laser within the glass sample. After etching the crystallites, three-dimensional holes are formed in the glass sample. We produce straight and Y-branched holes in the glass sample. This technique can be applied to the fields of microoptics, microelectronics and microchemicals.