Evaluation of the growth behaviour of gold film surfaces evaporation-deposited on mica under different conditions

被引:53
作者
Liu, ZH
Brown, NMD
McKinley, A
机构
[1] Surface Science Laboratory, Sch. of Appl. Biol. and Chem. Sci., University of Ulster
关键词
D O I
10.1088/0953-8984/9/1/009
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
A systematic AFM study of gold films deposited on mica substrates under a range of selected conditions reveals the evolution of the surface morphology of the films as a function of growth temperature, film thickness, and deposition rate. Scaling analysis shows that the growth behaviour of the surfaces of these films can be considered as self-affine fractals. The observed topography follows island-type (3D) growth processes in the majority of cases with a roughness exponent, alpha, in the range 0.24-0.75, or quasi-2D island growth in the remainder with alpha = 1.19 or 1.45. In the latter cases, however, the two gold films grown under the particular conditions used reflect typical growth models expressing a high roughness exponent, well consistent with theoretical prediction.
引用
收藏
页码:59 / 71
页数:13
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