Reactive accelerated cluster erosion (RACE) by ionized cluster beams

被引:23
作者
Gspann, J [1 ]
机构
[1] FORSCHUNGSZENTRUM KARLSRUHE,INST MIKROSTRUKTURTECH,D-70261 KARLSRUHE,GERMANY
关键词
D O I
10.1016/0168-583X(95)01252-4
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Beams of ionized clusters accelerated up to about 120 keV kinetic energy per cluster are used for cluster impact lithography. Chemical reactions of clusters of CO2, or of SF6, respectively, are found to assist the physical erosion by hypervelocity cluster impacts in yielding volatile products. Natural diamond, silicon and Pyrex glass have been microstructured showing very smooth eroded surfaces.
引用
收藏
页码:86 / 88
页数:3
相关论文
共 5 条
[1]   Microstructuring by nanoparticle impact lithography [J].
Gspann, J .
SENSORS AND ACTUATORS A-PHYSICAL, 1995, 51 (01) :37-39
[2]  
GSPANN J, 1993, Z PHYS D ATOM MOL CL, V26, pS174, DOI 10.1007/BF01425655
[3]  
GSPANN J, 1992, PHYSICS CHEM FINITE, V2, P1115
[4]  
INSEPOV Z, 1994, T MRS JAP, V17, P111
[5]  
TAKAGI T, 1988, IONIZED CLUSTER BEAM