High sensitivity quadrupole mass spectrometry of neutrals sputtered by UV-laser ablation of polymers

被引：20

作者：

Lazare, S

Guan, WP

Drilhole, D

机构：

[1] Lab. Photochimie Photophysique M., URA 348 du CNRS, Université de Bordeaux I, 33405 Talence

来源：

APPLIED SURFACE SCIENCE | 1996年 / 96-8卷

关键词：

D O I：

10.1016/0169-4332(95)00562-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Laser Ablation-Sputtered Neutrals Spectrometry is developed as a portable system which consists of a commercial gas analyser (quadrupole mass spectrometer with e-beam ionization) in ultrahigh vacuum. ArF and KrF ablation of 20 polymers yielded mass spectra (1-200), rich in information, and mass intensity versus etching time for depth profiling analysis. The sensitivity is very high (100 ng of polymer can be probed) and microablation can be recorded by LA-SNMS.

引用

页码：605 / 610

页数：6

共 25 条

[1]

[Anonymous], 1991, STATIC SIMS HDB POLY

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