Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates

被引:1531
作者
Kim, SO
Solak, HH
Stoykovich, MP
Ferrier, NJ
de Pablo, JJ
Nealey, PF
机构
[1] Univ Wisconsin, Dept Chem Engn, Madison, WI 53706 USA
[2] Univ Wisconsin, Ctr Nanotechnol, Madison, WI 53706 USA
[3] Univ Wisconsin, Dept Mech Engn, Madison, WI 53706 USA
[4] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland
基金
美国国家科学基金会;
关键词
D O I
10.1038/nature01775
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Parallel processes for patterning densely packed nanometre- scale structures are critical for many diverse areas of nanotechnology. ;Thin films of diblock copolymers(1-11) can self-assemble into ordered periodic structures at the molecular scale (similar to5 to 50 nm), and have been used as templates to fabricate quantum dots(1,2), nanowires(3-5), magnetic storage media(6), nanopores(7) and silicon capacitors(8). Unfortunately, perfect periodic domain ordering can only be achieved over micrometre-scale areas at best(12,13) and defects exist at the edges of grain boundaries. These limitations preclude the use of block-copolymer lithography for many advanced applications(14). Graphoepitaxy(12,15), in-plane electric fields(3,16), temperature gradients(17), and directional solidification(14,18) have also been demonstrated to induce orientation or long-range order with varying degrees of success. Here we demonstrate the integration of thin films of block copolymer with advanced lithographic techniques to induce epitaxial self-assembly of domains. The resulting patterns are defect-free, are oriented and registered with the underlying substrate and can be created over arbitrarily large areas. These structures are determined by the size and quality of the lithographically defined surface pattern rather than by the inherent limitations of the self-assembly process. Our results illustrate how hybrid strategies to nanofabrication allow for molecular level control in existing manufacturing processes.
引用
收藏
页码:411 / 414
页数:4
相关论文
共 30 条
  • [1] BLOCK COPOLYMER THERMODYNAMICS - THEORY AND EXPERIMENT
    BATES, FS
    FREDRICKSON, GH
    [J]. ANNUAL REVIEW OF PHYSICAL CHEMISTRY, 1990, 41 (01) : 525 - 557
  • [2] Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication
    Black, CT
    Guarini, KW
    Milkove, KR
    Baker, SM
    Russell, TP
    Tuominen, MT
    [J]. APPLIED PHYSICS LETTERS, 2001, 79 (03) : 409 - 411
  • [3] Single-grain lamellar microdomain from a diblock copolymer
    Bodycomb, J
    Funaki, Y
    Kimishima, K
    Hashimoto, T
    [J]. MACROMOLECULES, 1999, 32 (06) : 2075 - 2077
  • [4] Ordered bicontinuous nanoporous and nanorelief ceramic films from self assembling polymer precursors
    Chan, VZH
    Hoffman, J
    Lee, VY
    Iatrou, H
    Avgeropoulos, A
    Hadjichristidis, N
    Miller, RD
    Thomas, EL
    [J]. SCIENCE, 1999, 286 (5445) : 1716 - 1719
  • [5] Fabrication of nanostructures with long-range order using block copolymer lithography
    Cheng, JY
    Ross, CA
    Thomas, EL
    Smith, HI
    Vancso, GJ
    [J]. APPLIED PHYSICS LETTERS, 2002, 81 (19) : 3657 - 3659
  • [6] Cheng JY, 2001, ADV MATER, V13, P1174, DOI 10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO
  • [7] 2-Q
  • [8] Microdomain patterns from directional eutectic solidification and epitaxy
    De Rosa, C
    Park, C
    Thomas, EL
    Lotz, B
    [J]. NATURE, 2000, 405 (6785) : 433 - 437
  • [9] Photochemistry and patterning of self-assembled monolayer films containing aromatic hydrocarbon functional groups
    Dulcey, CS
    Georger, JH
    Chen, MS
    McElvany, SW
    OFerrall, CE
    Benezra, VI
    Calvert, JM
    [J]. LANGMUIR, 1996, 12 (06) : 1638 - 1650
  • [10] Block copolymer thin films: Physics and applications
    Fasolka, MJ
    Mayes, AM
    [J]. ANNUAL REVIEW OF MATERIALS RESEARCH, 2001, 31 : 323 - 355