Photolithographic patterning of phosphor screens by electrophoretic deposition for field emission display application

The patterning of phosphor screens was carried out using a lithographic technique and electrophoretic deposition of phosphor particles for high-resolution field emission display applications. The electrophoretic deposition and photolithography steps were established. Patterned phosphor screens were fabricated by controlling process parameters such as electrophoretic deposition rate in combination with a well-controlled photoresist process in order to achieve proper pixel size with clear boundaries. (C) 1998 American Vacuum Society.