X-ray diffraction and Raman scattering measurements on silica xerogels

被引:13
作者
Caponi, S
Ferrari, M
Fontana, A [1 ]
Masciovecchio, C
Mermet, A
Montagna, M
Rossi, F
Ruocco, G
Sette, F
机构
[1] Univ Trent, Dipartimento Fis, I-38050 Povo, Trento, Italy
[2] Univ Aquila, Dipartimento Fis, I-67100 Laquila, Italy
[3] Univ Trent, Ist Nazl Fis Mat, I-38050 Povo, Trento, Italy
[4] CNR, Ctr Fis Stati Aggregati, I-38050 Povo, Trento, Italy
[5] Sincrotrone Trieste, I-34012 Trieste, Italy
[6] Univ Roma La Sapienza, Dipartimento Fis, I-00185 Rome, Italy
[7] Univ Roma La Sapienza, Ist Nazl Fis Mat, I-00185 Rome, Italy
[8] European Synchrotron Radiat Facil, F-38043 Grenoble, France
关键词
D O I
10.1016/S0022-3093(02)01451-5
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The dynamics and the structure of silica xerogels at different degrees of densification have been studied by small angle X-ray scattering and Raman scattering, with the aim to investigate the effects of the inhomogeneous structure on the excitations that give rise to the excess in the density of states (Boson peak). The results are compared with those of specific heat measurements on the same samples. The present results show that the existence of the pores, whose medium size is in the 30-60 Angstrom range, does not appreciably affect the density of states in the Boson peak frequency range. On the contrary, at lower frequencies (omega < 20 cm(-1)), a strong pore-size dependence is observed in the Raman spectra. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:135 / 141
页数:7
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