Studies on the spin coating process of silica films

被引:57
作者
Huang, YY [1 ]
Chou, KS [1 ]
机构
[1] Natl Tsing Hua Univ, Dept Chem Engn, Hsinchu 30013, Taiwan
关键词
silica film; spin coating; process window;
D O I
10.1016/S0272-8842(02)00191-8
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Silica xerogel films with good uniformity, and various thicknesses were Successfully prepared by a two-step acid-base catalyst procedure and spin coating. After the addition of ammonia catalyst, the sol changes gradually from a Newtonian fluid to a shear-thinning one due to the progress of polymerization reactions. An empirical equation using the relative ratio of reaction time to gel time can give successful prediction of sol viscosity. Our systematic study of the coating process indicates the existence of a process window in terms of t/t(gel) and spin speed can be defined for obtaining uniform and defect-free films. It is difficult to obtain films with good quality when the viscosity of the sol is either too high or too low. Another parameter that also exhibits strong influence on film thickness is the concentration of TEOS in the starting solution. Finally, the film thickness was found to correlate well with sol viscosity and spin speed as h =A eta(0.45) (ω) over bar (-0.62). (C) 2002 Elsevier Science Ltd and Techna S.r.l. All rights reserved.
引用
收藏
页码:485 / 493
页数:9
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