Spin coating process of sol-gel silicate films deposition: Effect of spin speed and processing temperature

被引：47

作者：

Vorotilov, K

Petrovsky, V

Vasiliev, V

机构：

[1] Moscow Institute of Radioengineering, Electronics and Automation, Moscow, 117454, Vernadsky prosp.

来源：

JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY | 1995年 / 5卷 / 03期

关键词：

sol-gel film; spin coating process; spin speed; processing temperature;

D O I：

10.1007/BF00487014

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The effect of two factors having the most important influence on spin coating process of sol-gel films: the spin speed and the temperature (of the substrate and the applied solution) during film deposition is discussed. It is shown, that film thickness and thickness uniformity are determined by centrifugal driving force dynamics, viscous polymer rheology, solvent evaporation dynamics, and film porous microstructure.

引用

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页码：173 / 183

页数：11

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