Structure and properties of reactive direct current magnetron sputtered niobium aluminum nitride coatings

被引:25
作者
Barshilia, Harish C. [1 ]
Deepthi, B. [1 ]
Rajam, K. S. [1 ]
Bhatti, Kanwal Preet [2 ]
Chaudhary, Sujeet [2 ]
机构
[1] Natl Aerosp Labs, Surface Engn Div, Bangalore 560017, Karnataka, India
[2] Indian Inst Technol, Dept Phys, New Delhi 110016, India
关键词
D O I
10.1557/JMR.2008.0168
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A reactive direct current magnetron sputtering system was used to prepare NbAlN coatings at different nitrogen flow rates and substrate bias voltages. Various properties of MAIN coatings were studied using x-ray diffraction, scanning electron microscopy, atomic force microscopy, x-ray photoelectron spectroscopy, nanoindentation, the four-probe method, a solar spectrum reflectometer and emissometer, spectroscopic ellipsometry, micro-Raman spectroscopy, and potentiodynamic polarization techniques. Single-phase NbAlN with BI NaCl structure was obtained for the coatings prepared at a nitrogen flow rate in the range of 1.5-3 sccm, a substrate bias voltage of -50 to -210 V, and a substrate temperature of 300 degrees C. Nanoindentation data showed that the optimized MAIN coating exhibited a maximum hardness of 2856 kg/mm(2). An approximately 100-nm-thick NbAlN-NbAlON tandem on copper substrate exhibited a high absorptance (0.93) and a low emittance (0.06), suitable for solar-selective applications. The spectroscopic ellipsometry and resistivity data established the metallic nature of NbAlN and the semitransparent behavior of NbAlON coatings. The corrosion resistance of NbAlN coatings was superior to that of the mild steel substrate. The addition of aluminum in NbN coatings increased the onset of oxidation in air from 350 to 700 degrees C. Vacuum-annealed NbAlN coatings were structurally stable up to 700 degrees C and retained their high hardness up to a temperature of 650 degrees C.
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收藏
页码:1258 / 1268
页数:11
相关论文
共 38 条
[1]   Study of surface morphology and optical properties of Nb2O5 thin films with annealing [J].
Agarwal, G ;
Reddy, GB .
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2005, 16 (01) :21-24
[2]  
[Anonymous], MAT SCI ENG A
[3]   High-temperature oxidation resistance of Cr1-xAlxN thin films deposited by reactive magnetron sputtering [J].
Banakh, O ;
Schmid, PE ;
Sanjinés, R ;
Lévy, E .
SURFACE & COATINGS TECHNOLOGY, 2003, 163 :57-61
[4]   A comparative study of reactive direct current magnetron sputtered CrAlN and CrN coatings [J].
Barshilia, Harish C. ;
Selvakumar, N. ;
Deepthi, B. ;
Rajam, K. S. .
SURFACE & COATINGS TECHNOLOGY, 2006, 201 (06) :2193-2201
[5]   Characterization of low temperature deposited nanolayered TiN/NbN multilayer coatings by cross-sectional transmission electron microscopy [J].
Barshilia, HC ;
Rajam, KS ;
Rao, DVS .
SURFACE & COATINGS TECHNOLOGY, 2006, 200 (14-15) :4586-4593
[6]   Structure, hardness and thermal stability of TiAlN and nanolayered TiAlN/CrN multilayer films [J].
Barshilia, HC ;
Prakash, MS ;
Jain, A ;
Rajam, KS .
VACUUM, 2005, 77 (02) :169-179
[7]   Raman spectroscopy studies on the thermal stability of TiN, CrN, TiAlN coatings and nanolayered TiN/CrN, TiAlN/CrN multilayer coatings [J].
Barshilia, HC ;
Rajam, KS .
JOURNAL OF MATERIALS RESEARCH, 2004, 19 (11) :3196-3205
[8]   Structure and properties of reactive DC magnetron sputtered TiN/NbN hard superlattices [J].
Barshilia, HC ;
Rajam, KS .
SURFACE & COATINGS TECHNOLOGY, 2004, 183 (2-3) :174-183
[9]  
Cullity B., 1978, ELEMENTS XRAY DIFFRA
[10]   Corrosion of CrN and TiAlN coatings in chloride-containing atmospheres [J].
Cunha, L ;
Andritschky, M ;
Rebouta, L ;
Pischow, K .
SURFACE & COATINGS TECHNOLOGY, 1999, 116 :1152-1160