Spontaneous crystallographic instabilities of Pb nanoparticles in a SiO matrix

被引：14

作者：

Be'er, Avraham ^{[1
]}

Kofman, Richard

Phillipp, Fritz

Lereah, Yossi

机构：

[1] Tel Aviv Univ, Fac Engn, Dept Phys Elect, IL-69978 Tel Aviv, Israel

[2] Univ Nice, Phys Mat Condensee Lab, Unite Assoc 6622, CNRS, F-06108 Nice 2, France

[3] Max Planck Inst Met Res, D-70569 Stuttgart, Germany

来源：

PHYSICAL REVIEW B | 2007年 / 76卷 / 07期

关键词：

D O I：

10.1103/PhysRevB.76.075410

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The phenomenon of spontaneous instabilities of Pb nanoparticles was studied quantitatively by time-resolved transmission electron microscopy. The phenomenon rates were studied by high-resolution electron microscopy and by dark field microscopy. The origin of the phenomenon as a radiation effect of the high voltage electron beam was excluded by finding the same rates at 200 and 1250 kV electron beams, below and above the threshold for the knock-on process, respectively. The dependence of phenomenon rate on the particles' size was found to be inversely proportional to the particle volume. The temperature was found to influence both the probability for a particle to be in the unstable state and the rate of instabilities. The results are compared with our recent results obtained for spontaneous instabilities of Bi nanoparticles.

引用

页数：5