Effects of temperature variation (300-600 K) in MOSFET modeling in 6H-silicon carbide

被引:44
作者
Hasanuzzaman, M [1 ]
Islam, SK
Tolbert, LM
机构
[1] Univ Tennessee, Dept Elect & Comp Engn, Knoxville, TN 37996 USA
[2] Oak Ridge Natl Lab, Natl Transport Res Ctr, Oak Ridge, TN 37831 USA
关键词
high temperature MOSFET; silicon carbide; temperature variation effect;
D O I
10.1016/S0038-1101(03)00293-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Silicon carbide (SiC) based devices perform very well in severe environments and show excellent device characteristics at very high temperatures and in high radiation environments. An analytical model for a lateral MOSFET that includes the effects of temperature variation in 6H-SiC poly-type has been developed. The effects of elevated ambient and substrate temperatures (300-600 K) on the electrical characteristics as well as the variation of large and small signal parameters of the lateral MOSFET have been studied. The model includes the effects of temperature on the threshold voltage, carrier mobility, the body leakage current, and the drain and source contact region resistances. The MOSFET output characteristics and parameter values have been compared with previously measured experimental data. A good agreement between the analytical model and the experimental data has been observed. (C) 2003 Elsevier Ltd. All rights reserved.
引用
收藏
页码:125 / 132
页数:8
相关论文
共 18 条
[1]  
[Anonymous], 1999, DEVICES INTEGRATED C
[2]   COMPARISON OF 6H-SIC, 3C-SIC, AND SI FOR POWER DEVICES [J].
BHATNAGAR, M ;
BALIGA, BJ .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1993, 40 (03) :645-655
[3]  
Goldberg Yu., 2001, Properties of Advanced Semiconductor Materials: GaN, AIN, InN, BN, SiC, SiGe
[4]  
Hasanuzzaman M, 2003, POWER AND ENERGY SYSTEMS, PROCEEDINGS, P313
[5]   LARGE-BAND-GAP SIC, III-V NITRIDE, AND II-VI ZNSE-BASED SEMICONDUCTOR-DEVICE TECHNOLOGIES [J].
MORKOC, H ;
STRITE, S ;
GAO, GB ;
LIN, ME ;
SVERDLOV, B ;
BURNS, M .
JOURNAL OF APPLIED PHYSICS, 1994, 76 (03) :1363-1398
[6]  
Ozpineci B., 2002, International Journal of High Speed Electronics and Systems, V12, P439, DOI 10.1142/S0129156402001368
[7]  
Ozpineci B, 2001, IEEE IND ELEC, P1061, DOI 10.1109/IECON.2001.975927
[8]   6H silicon carbide MOSFET modelling for high temperature analogue integrated circuits (25-500 degrees C) [J].
Rebello, NS ;
Shoucair, FS ;
Palmour, JW .
IEE PROCEEDINGS-CIRCUITS DEVICES AND SYSTEMS, 1996, 143 (02) :115-122
[9]   Electron mobility models for 4H, 6H, and 3C SiC [J].
Roschke, M ;
Schwierz, F .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2001, 48 (07) :1442-1447
[10]   OPTIMUM SEMICONDUCTORS FOR HIGH-POWER ELECTRONICS [J].
SHENAI, K ;
SCOTT, RS ;
BALIGA, BJ .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1989, 36 (09) :1811-1823