Interdiffusion in InGaAs/GaAs: The effect of growth conditions

被引:15
作者
Khreis, OM [1 ]
Homewood, KP
Gillin, WP
机构
[1] Univ Surrey, Sch Elect Engn Informat Technol & Math, Guildford GU2 5XH, Surrey, England
[2] Univ London Queen Mary & Westfield Coll, Dept Phys, London E1 4NS, England
关键词
D O I
10.1063/1.368079
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effect of growth temperature and group-V to group-III flux ratio on the intermixing process in molecular beam epitaxial grown InxGa1-xAs/GaAs multiquantum wells were studied by means of photoluminescence coupled with repetitive thermal anneal experiments. We have shown that, for a wide range of growth conditions (growth temperatures from 565 to 636 degrees C and flux ratios from 5:1 to 25:1) the interdiffusion is controlled solely by a constant background concentration of vacancies which are probably introduced into the substrate during its manufacture. We have shown that, only growth at very low temperatures (470 degrees C) will result in appreciable excess vacancies. (C) 1998 American Institute of Physics.
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页码:232 / 236
页数:5
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