Calixarenes - Prospective materials for nanofabrications

被引：25

作者：

Ohnishi, Y

Fujita, J

Ochiai, Y

Matsui, S

机构：

[1] Fundamental Research Laboratories, NEC Corporation, 34 Miyukigaoka

来源：

MICROELECTRONIC ENGINEERING | 1997年 / 35卷 / 1-4期

关键词：

D O I：

10.1016/S0167-9317(96)00168-2

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A new group of electron resists, calixarene resists, are presented. These small, cluster-like molecules provide convenient means for making nanostructures. For example, hexaacetate of methylcalix[6]arene easily gives a 10 nm scale pattern in E-beam lithography with conventional resist processes. Synthesis, identification and characterization of these compounds are described with examples of nanofabrications.

引用

页码：117 / 120

页数：4

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