Accurate mobility and carrier concentration analysis for GaN

被引:77
作者
Look, DC
Sizelove, JR
Keller, S
Wu, YF
Mishra, UK
DenBaars, SP
机构
[1] USAF,WRIGHT LAB,AVION DIRECTORATE,WRIGHT PATTERSON AFB,OH 45433
[2] UNIV CALIF SANTA BARBARA,ELECT & COMP ENGN & MAT DEPT,SANTA BARBARA,CA 93106
关键词
semiconductors; thin films; epitoxy; electron-phonon interactions; electronic transport;
D O I
10.1016/S0038-1098(96)00784-3
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Temperature-dependent mobility mu and carrier concentration n data are simultaneously fitted in a high-quality, n-type GaN layer with wurtzite structure grown by metalorganic chemical vapor deposition. The mobility fit is found to be very important for obtaining the correct acceptor concentration, N-A similar or equal to 1.1 +/- 0.2 x 10(17) cm(-3). Using this range of N-A, a fit to the n vs T curve, corrected for Hall r-factor gives two donor levels of concentration (energy): 2.7 +/- 0.2 x 10(17) cm(-3) (7.5 +/- 1.5 meV) and 1.5 +/- 0.2 x 10(17) cm(-3) (58 +/- 2 meV), respectively. However, the n vs T curve by itself is inadequate for an accurate determination of N-A; in this case, acceptable fits can be obtained for N-A ranging from 0 to 1.2 x 10(17) cm(-3). (C) 1997 Published by Elsevier Science Ltd.
引用
收藏
页码:297 / 300
页数:4
相关论文
共 23 条
[1]  
Bykhovski AD, 1996, APPL PHYS LETT, V68, P818, DOI 10.1063/1.116543
[2]   ELECTRON MOBILITIES IN GALLIUM, INDIUM, AND ALUMINUM NITRIDES [J].
CHIN, VWL ;
TANSLEY, TL ;
OSTOCHAN, T .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (11) :7365-7372
[3]  
DAGYS A, 1994, HDB PHYSICAL PROPERT
[4]   THE EFFECT OF ORGANOMETALLIC VAPOR-PHASE EPITAXIAL-GROWTH CONDITIONS ON WURTZITE GAN ELECTRON-TRANSPORT PROPERTIES [J].
GASKILL, DK ;
WICKENDEN, AE ;
DOVERSPIKE, K ;
TADAYON, B ;
ROWLAND, LB .
JOURNAL OF ELECTRONIC MATERIALS, 1995, 24 (11) :1525-1530
[5]  
Gotz W, 1996, APPL PHYS LETT, V68, P3144, DOI 10.1063/1.115805
[6]   Influence of sapphire nitridation on properties of gallium nitride grown by metalorganic chemical vapor deposition [J].
Keller, S ;
Keller, BP ;
Wu, YF ;
Heying, B ;
Kapolnek, D ;
Speck, JS ;
Mishra, UK ;
DenBaars, SP .
APPLIED PHYSICS LETTERS, 1996, 68 (11) :1525-1527
[7]   TEMPERATURE ACTIVATED CONDUCTANCE IN GAN/ALGAN HETEROSTRUCTURE FIELD-EFFECT TRANSISTORS OPERATING AT TEMPERATURES UP TO 300-DEGREES-C [J].
KHAN, MA ;
SHUR, MS ;
KUZNIA, JN ;
CHEN, Q ;
BURM, J ;
SCHAFF, W .
APPLIED PHYSICS LETTERS, 1995, 66 (09) :1083-1085
[8]   REFRACTIVE-INDEXES OF WURTZITE AND ZINCBLENDE GAN [J].
LIN, ME ;
SVERDLOV, BN ;
STRITE, S ;
MORKOC, H ;
DRAKIN, AE .
ELECTRONICS LETTERS, 1993, 29 (20) :1759-1761
[9]   ALLOY SCATTERING IN P-TYPE ALXGA1-XAS [J].
LOOK, DC ;
LORANCE, DK ;
SIZELOVE, JR ;
STUTZ, CE ;
EVANS, KR ;
WHITSON, DW .
JOURNAL OF APPLIED PHYSICS, 1992, 71 (01) :260-266
[10]  
LOOK DC, 1989, ELECT CHARACTERIZATI, P116